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Ion beam assisted deposition equipment

Ion beam assisted deposition refers to the technology of bombardment with low energy ion beam at the same time of vapor deposition to form simple or compound thin films, and the on-line structure analysis can be carried out by reflective high energy elect

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Pulsed laser deposition equipment

Pulsed laser deposition is a method that uses high power pulsed laser to evaporate the material and form a thin film on the substrate. This technology has a wide range of applications, ranging from elements, oxides, nitrides to polymers, and because it

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Magnetron sputtering coating equipment

Sputtering coating is a technique in which the bombarded particles are deposited on the substrate by bombarding the target surface with energetic particles in vacuum. Sputtering coating has the advantages of strong adhesion of film and substrate and goo

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Evaporation coating equipment

Evaporation coating is a technology in which the coating material is heated by resistance or electron beam in vacuum, and its atoms or molecules are evaporated from the surface and deposited on the surface of the substrate to form a thin film. this techno

Design parameters

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    Building 25, No. 1388 Zhangdong Road, Pudong New area, Shanghai

  • Tel

    021-50817399

  • Fax

    021-64056173

  • Add

    Building 25, No. 1388 Zhangdong Road, Pudong New area, Shanghai

  • Fax

    021-64056173

  • Tel

    021-50817399

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